Prakash Gajurel, Ph.D

Experience

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  West Virginia University

  Aug 2013 - Dec 2019

  FETs and Optical Lab• Grown ZnO thin film; fabricated ZnO-FETs and studied the effect of Gate-Bias stress.• Designed and implemented optical experiments to investigate photo-voltage generation from metal-oxides interfaces. • Fabricated graphene-FETs and studied the transport phenomena of monolayer grapheneThin Films and Characterizations• Optimized chemical transfer process of CVD grown graphene and characterized the graphene/ graphene oxide films by AFM, Raman, and X-ray photoelectron spectroscopy.• Developed a method to oxidize monolayer graphene by oxygen plasma and studied contact frictional force on monolayer/bilayers graphene by AFM lateral scanning.• Performed Raman spectroscopy of layers materials (Bi2Se3, In2Se3, and VO2) to determine the film thickness and crystalline phases. C-AFM Lithography• Wrote conducting 2DEG micro-channels at metal oxides interfaces by a biased conducting atomic force microscope (c-AFM lithography) to study the plasmonic in graphene-complex oxide hybrid system.• Analyzed surface potential distribution on graphene-FETs by Kelvin Probe Force Microscopy (KPFM). Show less

  • Graduate Research Assistant

    Jan 2015 - Dec 2019

  • Graduate Teaching Assistant

    Aug 2013 - Dec 2014
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  Shared Research Facilities, WVU

  Jan 2014 - Dec 2019

  Cleanroom User

  • Graphene- FETs and Oxides photo-voltaic cells fabrication.• Thin film processing of Silicon and GaN• Photo-lithography, Metal/Metal oxides deposition (PVD) Processing equipments:1) Spin coating (Laurel technologies 400 spinner)2) UV Lithography (Suss Microtech MA6 Aligner)3) Flood exposure (OAI UV Flood exposure)4) Sputter deposition(CVC 610DC Magnetron sputtering station)5) Gold Wire Bonder (West Bond 74776E)6) Oxygen Plasma Asher (March PX-250 Plasma Asher)7) E-beam evaporation (BOC Temescal BJD-2000, Kurt J Lekser LAB18)8) Reactive Ion Etching (Trion Technology Minilock III RIE)Characterization equipment:1) Scanning Electron Microscope ( JEOL JSM-7600F)2) Stylus Profilometer ( Tencor Alpha-Step 200 )3) Optical Microscopy (Olympus BH-2 UMA)4) Raman Spectroscopy (Renishaw InVia) 5) Atomic Force Microscope(Asylum MFP-3D) 6) XPS/UPS (Physical Electronics PHI 5000 Versaprobe)7) XRD (Bruker D8 Discovery) Show less

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  Intel Corporation

  Mar 2020 - now

  Process Engineer