Evgeny Smirnov

Experience

• 

  Imec

  Jan 2009 - Jan 2011

  International scholar, PhD student

  Evaluation and study with research of processing damage of new advanced low-k materials with k-value for 22 nm interconnection node and beyond:I. Characterization of low-k films by: ellipsometric porosimetry (EP-10), FT-IR Nicolet 6700, water based goniometry, UVSE KLA-Tencor Aleris 8500, SEM, Hg-probe.II. UV curing treatments and CMP-tests for low-k materials.Realization of the research projects for: Intel, Samsung, ASM, TSMC, Hitachi, SBA materials, Ultimate Vacuum, Sumitomo.

• 

  MIKRON, JSC

  Jan 2011 - Jan 2012

  R&D Engineer

  Research in advanced metallization technology used for 32 nm interconnection node in Russia. Realization of the research projects for RUSNANO.

• 

  Crocus Nano Electronics, LLC

  Mar 2012 - now

  Crocus Nano Electronics is the first high volume magnetic wafer processing fab in the world, capable of manufacturing MLU-based devices on 300-mm wafers starting at 90-nm, and shrinking to 65-nm and 45-nm technology nodes. CROCUS NANOELECTRONICS Builds the first magnetic memory wafer fab in the world, capable of high volume manufacturing of MRAM devices on 300-mm wafers at 90-nm and 65-nm feature sizes. CNE will provide an advanced chips with MAGNETIC LOGIC UNIT™ (MLU) architecture enables to implement logic and memory functions in one cell.

  • Senior PVD Process Engineer

    Oct 2014 - now

  • PVD Process Engineer

    Mar 2012 - now